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Torr CRC-150 Compact Research Coater

The CRC-150 uses a DC and RF compatible water-cooled planar magnetron source. Several options provide expanded process capabilities, including a water-cooled stage to protect extremely heat sensitive samples, such as polycarbonate membranes. The system's optional stage heaters can rapidly and uniformly heat a substrate to a maximum of 600°C during deposition for improved film adhesion and uniformity, as well as to control grain size of the deposited films. While the CRC-150 comes with a standard DC etch mode for a gentle, low power, plasma glow discharge precleaning, and RF etch option can be used for specific etch applications or for removal of bonded surface material prior to coating.

High rate planar magnetron sputtering produces uniform, adherent thin films. The new source shutters protect the sample surface from target oxide contamination during a pre-sputter run.

Highly Versatile, Space-Saving and Affordable
A wide variety of materials can be deposited, including: aluminum, carbon, chromium, gold, Teflon©, SiO2, tantalum, tungsten and titanium. And since it is completely manually controlled, the compact tabletop sputtering system is easily adaptable and also economical.

Process Efficiency
It takes less than thirty seconds to change a solid disc target, so the CRC-150 is easily reconfigured for applications requiring a different materials depositions 60 l/sec. Turbomolecular vacuum pump allows 10-6 Torr range base vacuum. Operating vacuum of low 10-5 Torr reached in 15 minutes.

Low Maintenance
Turbomolecular pump needs zero maintenance while external roughing pump just requires routine oil changes. Chamber cleaning is the only programmed maintenance required on a routine basis.

Serial Number: 1209

Included Options;

1)     RF300 13.56 Mhz RF Generator (300 Watt)

2)     FTM 2000 , model SQM-160, Film Thickness Monitor

3)     Trivac D5E Pump

4)     RF Load

     
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