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| K & Us Equipment, Inc., 13350 West Park Ave., Ste B, Boulder Creek, CA 95006-9333, USA | Phone (831) 338-7246, Fax (831) 338-7962 | Contact www.kandus.com |
Sputtered Films Inc Two Target Sputtering System
Sputtered Films Inc Two Target Sputtering System The Two-Target Sputtering System, built by Sputtered Films, Inc. is based on the "Research S-Gun" and as such, is capable of high sputtering rates (~ A/min.) for metal, semiconductor and dielectric materials with a minimal substrate bombardment caused by secondary electrons. The deposition chamber is non-loadlocked providing for easy sample loading and target/gun changing. It is evacuated with at turbo pump. Samples are loaded onto platen which mounts into a rotating 4-position planetary "flat-wheel". Several flow controllers are available for Nitrogen, Oxygen or Argon. The manual is included. A water circulator and lots of used targets could be added as well. (The unit only comes with two power supplies not three as pictured.)
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| K & Us Equipment, Inc., 13350 West Park Ave., Ste B, Boulder Creek, CA 95006-9333, USA | Phone (831) 338-7246, Fax (831) 338-7962 | Contact www.kandus.com |
| Copyright © 2010 K & Us Equipment, Inc. All Rights Reserved |
